NIMNIL_JKU Print E-mail

1. Laboratory: NIMNIL_JKU

 Center for Surface and Nanoanalytics

Johannes Kepler University
Altenbergerstr. 69
4040 Linz

2. Contact point:

Name: Dr. Kurt Hingerl

Position: Full Professor, Material Science, Center for Surface and Nano-analytics.


Tel.: +43 732 2468 9662

Fax.: +43 732 2468 9696


3. Access rules:

Facilities availability for external users: 

We are looking for external interested parties and will be happy to cooperate, if measurements are done by the external interested parties (in case of ellipsomeetry and Raman)

 Expenses reimbursement type:

1)     Either scientific co-operation

2)     or clear charging of hours (according to ZONA Benutzerordnung)

Rules on cooperation:  


4. Equipment


12E1. -  UV-VIS Ellipsometer, 193 nm- 1.7µm, (0.7- 6.5 eV), Variable angle of incidence
Focusing probes    Can measure transmission ellipsometry as well as reflection ellipsometry
12E2. IR Ellipsometer, 33µm- 1.7µm, 38 meV- 0.7 eV, 300- 6000 cm-1    Can measure transmission ellipsometry as well as reflection ellipsometry


12S1. - Confocal Raman Spectrometer for Graphene , Cooled Si detector Cooled InGas detector
For Raman as well as PL or fluorescence (down to 1.7 µm)    3 excitation lasers:
532 nm, 632 nm and 785 nm


12M1. - Transmission electron microscope. With EDX, dark field, bright field    Other details on request.
12M1. - Focused ion beam REM, Similar system as in the link, with EBSD, 2 electron detectors, EDX, etc.    Other details on request.

6. Expertise



Extremely high expertise; also for anisotropic samples, etc.

Also for normal incidence: Reflection anisotropy spectroscopy

Also for simulations of structured samples, etc-.



Yes. Raman spectroscopy


 Yes for electron microscopy


Table: Expertise by material type and sample geometry combinations:

Materials types
Complex shape object Bulk samples or bars
Substrate layer(s) on substrate



Thin films

Isotropic materials
Photonic crystals              
Mesoscopic samples              
inversion symmetrical
Active materials              
Controllable materials              
Diffraction gratings              
Scattering media              

Notation used here:

Frequency range: MHz, GHz, THz or optical
R - reflection coefficient amplitude or intensity;
T - transmission coefficient or intensity,
P - phase information;
A - reflection and transmission on many angles of incidence;
E - ellipsometry data;
D - ray velocity direction or distortion (do not mix, please, with isotropic refraction index characterization);
S - internal structure investigation with microscopy (nanoscopy);
Ch - chemical properties investigation (metal or dielectric etc.);
Chi(2)/Chi(3) of the material