Yes, in principle; not all instruments have the same facility of use. Depending on the particular instrument a choice for a collaborative effort or a more simple access can be decided upon.
Expenses reimbursement type:
Different modes of operation are available ranging from collaborative efforts (that are by their nature free) to full cost models.
Rules on cooperation:
No standard contracts are availble. IP agreements will be tailor-made.
3M6. - Single molecule fluorescence microscope, Sample scanning confocal, Single photon correlations using time-correlated single photon counting, Single molecule fluorescence spectra, Single molecule CCD imaging
3M7.- Veeco Dimension 3100, Atomic force microscope, 90x90x6 um scanner, 200 mm sample stage, AFM, STM
3M8.- FEI XL30, Scanning electron microscope, TFE SEM. EDAX EDS+EBSD, Gatan MonoCL, Kleindiek nanomanipulators
3M9.- FEI Helios, Focused ion beam/SEM, TFE SEM + Ga LMIS FIB, Raith Elphy pattern generator. Gas injectors for deposition of: Au, C, Pt, SiO2.
3R4.- Agilent HP 8168F, Continuous wave tunable laser, 1450-1590nm, up to 9mW power
3R5.- Fianium sc450, Supercontinuum white light source, 450-2400nm, 2W
3R6.- Coherent Innova 90 Ar laser, CW Ar laser (2x)
3R7.- Lynx, Time-bandwidth Lynx, 10 MHz rep rate, <8 ps pulses, 532 and 1064 nm , 0.5 W green
Other
3O1. -Becker Hickl DPC230, 16-channel time correlator (170 ps resolution)
6. Expertise
Ellipsometry
Thin-film analysis
Spectrometry
Photoluminescence and Raman spectroscopy
Microscopy Confocal and SNOM
Table: Expertise by material type and sample geometry combinations:
Materials types
Slabs
Complex shape object
Bulk samples or bars
Substrate
layer(s) on substrate
Sub-wave
length
samples
Thin films
Isotropic materials
Optical, R, T, P, A
Optical, R, T, P, A
Optical, R, T, P, A, E
Optical, R, T, P, A
Optical, R, T, P, A, E
Photonic crystals
Optical, R, T, P, A
Optical, R, T, P, A
Optical, R, T, P, A, E
Optical, R, T, P, A
Optical, R, T, P, A, E
Quasicrystals
Mesoscopic samples
Bianisotropic
Optical, R, T, P, A
Optical, R, T, P, A
Optical, R, T, P, A, E
Optical, R, T, P, A
Optical, R, T, P, A, E
Anisotropic
inversion symmetrical
Optical, R, T, P, A
Optical, R, T, P, A
Optical, R, T, P, A, E
Optical, R, T, P, A
Optical, R, T, P, A, E
Active materials
Controllable materials
Diffraction gratings
Scattering media
Other
Notation used here:
Frequency range: MHz, GHz, THz or optical R - reflection coefficient amplitude or intensity; T - transmission coefficient or intensity, P - phase information; A - reflection and transmission on many angles of incidence; E - ellipsometry data; D - ray velocity direction or distortion (do not mix, please, with isotropic refraction index characterization); S - internal structure investigation with microscopy (nanoscopy); Ch - chemical properties investigation (metal or dielectric etc.); Chi(2)/Chi(3) of the material