AMOLF |
1. Laboratory: AMOLF Name: Laurens Kuipers Position: Head of Center for Nanophotonics Email: l.kuipers"you know what"amolf.nl Tel.: +31207547100 Facilities availability for external users: Yes, in principle; not all instruments have the same facility of use. Depending on the particular instrument a choice for a collaborative effort or a more simple access can be decided upon. Expenses reimbursement type: Different modes of operation are available ranging from collaborative efforts (that are by their nature free) to full cost models. Rules on cooperation: No standard contracts are availble. IP agreements will be tailor-made.
4. Equipment Elipsometers: 3E1.- Woollam Vase ellipsometer, Spectroscopic ellipsometer, 300-1700 nm Spectrometers: 3S1.- Princeton Instruments Acton SpectraPro 2300i, spectrometers, with PIXIS Si CCD and OMA V LN-cooled InGaAs array detectors, 400-1600 nm 3S2.- Roper Scientific PIXIS100B, Spectroscopy system, 400-1100 nm, QE ~ 90% 3M1.- Scanning near field microscope, Phase- and polarization-sensitive, operating at visible, near infrared and telecom frequencies 3M2.- WiTec AlphaSNOM, SNOM/AFM/confocal microscope, piezo-scanned sample stage 3M3.- Nikon C1 inverted confocal microscope, confocal/TIRF microscope 3M4. - Scanning near-field manipulation microscope, Shear-force (non-contact), Tapered fiber probe, Allows to pick up nanoparticles (<50 nm), spatial resolution 100x100x5 nm. Sample scanning and tip scanning 3M5. - Fourier scattering microscope, Dark-field microscopy, Extinction microscopy, Fourier imaging 3M6. - Single molecule fluorescence microscope, Sample scanning confocal, Single photon correlations using time-correlated single photon counting, Single molecule fluorescence spectra, Single molecule CCD imaging 3M7.- Veeco Dimension 3100, Atomic force microscope, 90x90x6 um scanner, 200 mm sample stage, AFM, STM 3M8.- FEI XL30, Scanning electron microscope, TFE SEM. EDAX EDS+EBSD, Gatan MonoCL, Kleindiek nanomanipulators 3M9.- FEI Helios, Focused ion beam/SEM, TFE SEM + Ga LMIS FIB, Raith Elphy pattern generator. Gas injectors for deposition of: Au, C, Pt, SiO2. 3R1.- Spectra Physics: Femtosecond laser system , Tsunami oscillator, 700-1080nm, >3W, 80MHz 3R3.- Coherent: Amplified femtosecond laser system, Micra oscillator, 15fs, 780-820nm, >300mW, 80MHz, RegA amplifier, 100fs, 250kHz, OPA 9800, 1200-2400nm, 40mW 3R4.- Agilent HP 8168F, Continuous wave tunable laser, 1450-1590nm, up to 9mW power 3R5.- Fianium sc450, Supercontinuum white light source, 450-2400nm, 2W 3R6.- Coherent Innova 90 Ar laser, CW Ar laser (2x) 3R7.- Lynx, Time-bandwidth Lynx, 10 MHz rep rate, <8 ps pulses, 532 and 1064 nm , 0.5 W green
Other 3O1. -Becker Hickl DPC230, 16-channel time correlator (170 ps resolution)
6. Expertise Ellipsometry Thin-film analysis
Photoluminescence and Raman spectroscopy
Table: Expertise by material type and sample geometry combinations:
Notation used here: Frequency range: MHz, GHz, THz or optical
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